A moiré is an interference pattern that appears when two different periodic structures are overlaid. The image created is extremely sensitive to small variations in the original layers and is thus very interesting for anti-counterfeit protection. We present a microfabricated 1D moiré enabling complex high-resolution patterns as a significantly improved security feature that cannot be reproduced using standard printing methods. Furthermore
we demonstrate
theoretically and experimentally
that a microscopic deviation from the original design results in a macroscopic variation in the moiré that is clearly visible to the naked eye. The record resolution achieved in the elements fabricated and the increased design freedom
make these high-resolution moirés excellent candidates for a variety of visually appealing security applications.
Amidror I. A generalized fourier-based method for the analysis of 2D moiré envelope-forms in screen superpositions.J Mod Optics1994;41: 1837–1862..
Kamal H, Völkel R, Alda J. Properties of moiré magnifiers.Optical Eng1998;37: 3007–3014..
Steenblik RA, Hurt MJ. Unison Micro-optic Security Film. In: van Renesse RL, editior. Optical Security and Counterfeit Deterrence Techniques V.Proc SPIE2004;5310: 321–327..
Schilling A, Thomkin WR, Staub R, Hersch RD, Chosson S, Amidror I. Diffractive moiré features for optically variable devices. In: van Renesse RL, editior. Optical Security and Counterfeit Deterrence Techniques VI.Proc SPIE2006;6075: 1–12..
Hersch RD, Chosson S. Band moiré images. Proceedings of SIGGRAPH 04, ACM Computer Graphics, Annual Conference Series; 2004: 239–247.
Madou M. Fundamentals of Microfabrication. Boca Raton: CRC press; 1997.
Xia YN, Whitesides GM. Soft lithography.Annu Rev Mater Sci1998;28: 153–184..
Llobera A, Wilke R, Johnson DW, Buttgenbach S. Polymer microlenses with modified micromolding in capillaries (MIMIC) technology.IEEE Photon Technol Lett2005;17: 2628–2630..
Schilling A, Merz R, Ossmann C, Herzig HP. Surface profiles of reflow microlenses under the influence of surface tension and gravity.Opt Eng2000;39: 2171–2176..
Lorenz H, Despont M, Fahrni N, Brugger J, Vettiger P, Renaud P. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS.Sensor Actuat A Phys1998;64: 33–39..