
Engineering Physics Division, Physical Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Dr MS 8212, Gaithersburg, MD 20899-8212, USA
RM Silver, Email: silver@nist.gov
Published:2016-03,
Published Online:05 November 2015,
Received:24 April 2015,
Revised:29 October 2015,
Accepted:04 November 2015
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Qin, J. et al. Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization. Light: Science & Applications, 5, e16038 (2016).
Qin, J. et al. Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization. Light: Science & Applications, 5, e16038 (2016). DOI: 10.1038/lsa.2016.38.
Quantitative optical measurements of deep subwavelength
three-dimensional (3D)
nanometric structures with sensitivity to sub-nanometer details address a ubiquitous measurement challenge. A Fourier domain normalization approach is used in the Fourier optical imaging code to simulate the full 3D scattered light field of nominally 15 nm-sized structures
accurately replicating the light field as a function of the focus position. Using the full 3D light field
nanometer scale details such as a 2 nm thin conformal oxide and nanometer topography are rigorously fitted for features less than one-thirtieth of the wavelength in size. The densely packed structures are positioned nearly an order of magnitude closer than the conventional Rayleigh resolution limit and can be measured with sub-nanometer parametric uncertainties. This approach enables a practical measurement sensitivity to size variations of only a few atoms in size using a high-throughput optical configuration with broad application in measuring nanometric structures and nanoelectronic devices.
computational microscopylight scatteringmetrologyquantitative nanoscale microscopysub-nanometer uncertainties
Hell SW, Wichman J. Breaking the diffraction resolution limit by stimulated emission: stimulated-emission-depletion fluorescence microscopy.Opt Lett1994;19: 780–782..
Betzig E, Patterson GH, Sougrat R, Lindwasser OW, Olenych Set al. Imaging intracellular fluorescent proteins at nanometer resolution.Science2006;313: 1642–1645..
Hell SW. Toward fluorescence nanoscopy.Nat Biotechnol2003;21: 1347–1355..
Rittweger E, Han KY, Irvine SE, Eggeling C, Hell SW. STED microscopy reveals crystal colour centres with nanometric resolution.Nat Photon2009;3: 144–147..
Mlodzianoski MJ, Juette MF, Beane GL, Bewersdorf J. Experimental characterization of 3D localization techniques for particle-tracking and super-resolution microscopy.Opt Expr2009;17: 8264–8277..
Speidel M, Jonáš A, Florin EL. Three-dimensional tracking of fluorescent nanoparticles with subnanometer precision by use of off-focus imaging.Opt Lett2003;28: 69–71..
Schermelleh L, Heintzmann R, Leonhardt H. A guide to super-resolution fluorescence microscopy.J Cell Biol2010;190: 165–175..
Kawata S, Inouye Y, Verma P. Plasmonics for near-field nano-imaging and superlensing.Nat Photon2009;3: 388–394..
Rang M, Jones AC, Zhou F, Li ZY, Wiley BJ. Optical near-field mapping of plasmonic nanoprisms.Nano Lett2008;8: 3357–3363..
Qin J, Iwami K, Umeda N. Direct evaluation of anchoring effects and vertical orientation profiling of liquid crystal films by near-field birefringence measurement.App Phys Expr2008;1: 111501..
Zhou R, Edwards C, Arbabi A, Popescu G, Goddard LL. Detecting 20 nm wide defects in large area nanopatterns using optical interferometric microscopy.Nano Lett2013;13: 3716–3721..
Rogers ETF, Lindberg J, Roy T, Savo S, Chad JEet al. A super-oscillatory lens optical microscope for subwavelength imaging.Nat Mater2012;11: 432–435..
Lauer V. New approach to optical diffraction tomography yielding a vector equation of diffraction tomography and a novel tomographic microscope.J Microsc2002;205: 165–176..
Belkebir K, Chaumet PC, Sentenac A Influence of multiple scattering on three-dimensional imaging with optical diffraction tomography.J Opt Soc Am A Opt Image Sci Vis2006;23: 586–595..
Maire G, Drsek F, Girard J, Giovannini H, Talneau Aet al. Experimental demonstration of quantitative imaging beyond Abbe's limit with optical diffraction tomography.Phys Rev Lett2009;102: 213905..
Girard J, Maire G, Giovannini H, Talneau A, Belkebir Ket al. Nanometric resolution using far-field optical tomographic microscopy in the multiple scattering regime.Phys Rev A2010;82: 061801..
Zhang T, Ruan Y, Maire G, Sentenac D, Talneau Aet al. Full-polarized tomographic diffraction microscopy achieves a resolution about one-fourth of the wavelength.Phys Rev Lett2013;111: 243904..
Arhab S, Soriano G, Ruan Y, Maire G, Talneau Aet al. Nanometric resolution with far-field optical profilometry.Phys Rev Lett2013;111: 053902..
Toraldo di Francia G. Resolving power and information.J Opt Soc Am1955;45: 497–499..
Danuser G. Super-resolution microscopy using normal flow decoding and geometric constraints.J Microsc2001;204: 136–149..
Chaumet PC, Sentenac A, Belkebir K, Maire G, Giovannini H. Improving the resolution of grating-assisted optical diffraction tomography using a priori information in the reconstruction procedure.J Modern Opt2010;57: 798–808..
Huang HT, Terry FL Jr. Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement andin situ, real-time process monitoring [published erratum appears in Thin Solid Films 2004; 468: 339–346.]Thin Solid Films2004;455–456: 828–836..
Silver RM, Barnes BM, Attota R, Jun J, Stocker Met al. Scatterfield microscopy for extending the limits of image-based optical metrology.Appl Opt2007;46: 4248–4257..
Vedam K, McMarr PJ, Narayan J. Nondestructive depth profiling by spectroscopic ellipsometry.Appl Phys Lett1985;47: 339–341..
Marx E. Images of strips on and trenches in substrates.Appl Opt2007;46: 5571–5587..
Germer TA, Marx E. Simulations of optical microscope images. In: ArchieCN, editor.Metrology, Inspection, and Process Control for Microlithography XX;19–24 February 2006; San Jose, CA, USA. SPIE: Bellingham, WA, USA, 2006.p61520I.
Silver RM, Attota R, Stocker MT, Bishop M, Howard Let al. High-resolution opticalmetrology. In: Silver R, editor.Metrology, Inspection, and Process Control forMicrolithography XIX; February 27–March 4 2005; San Jose, CA, USA. SPIE:Bellingham, WA, USA, 2005. p67..
Qin J, Silver RM, Barnes BM, Zhou H, Goasmat F. Fourier domain optical tool normalization for quantitative parametric image reconstruction.Appl Opt2013;52: 6512–6522..
Attota R, Dixson RG. Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes.Appl Phys Lett2014;105: 043101..
Barnes BM, Sohn MY,Goasmat F, Zhou H, Vladár AE. Three-dimensional deep sub-wavelength defect detection using λ=193 nm optical microscopy.Opt Express2013;21: 26219–26226..
Moharam MG, Gaylord TK. Rigorous coupled-wave analysis of planar-grating diffraction.J Opt Soc Am1981;71: 811–818..
Kunz KS, Luebbers RJ.The Finite Difference Time Domain Methods for Electromagnetics. Boca Raton, FL, USA: CRC Press; 1993.
Pisarenco M, Maubach J, Setija I, Mattheij R. Aperiodic Fourier modal method in contrast-field formulation for simulation of scattering from finite structures.J Opt Soc Am A Opt Image Sci Vis2010;27: 2423–2431..
Silver RM, Barnes BM, Zhang NF, Zhou H, Vladár AEet al. Optimizing hybrid metrology through a consistent multi-tool parameter set and uncertainty model. In: Cain JP, editor.Metrology, Inspection, and Process Control for Microlithography XXVIII; 23–27 February 2014; San Jose, CA, USA. SPIE: Bellingham, WA, USA, 2014. p905004..
Honkanen M, Kettunen V, Tervo J, Turunen J. Fourier array illuminators with 100% efficiency: analytical Jones-matrix construction.J Mod Opt2000;47: 2351–2359..
Rao CR, Toutenburg H.Linear Models: Least Squares and Alternatives.Berlin: Springer; 1995.
Bates DM, Watts DG.Nonlinear Regression Analysis and Its Applications. New York: Wiley; 1998.
Silver RM, Zhang NF, Barnes BM, Zhou H, Qin J Nested uncertainties and hybrid metrology to improve measurement accuracy. In: Raymond C, editor.Metrology, Inspection, and Process Control for Microlithography XXV; February 27–March 3 2011; San Jose, CA, USA. SPIE: Bellingham, WA, USA, 2011. p797116.
Zhang NF, Silver RM, Zhou H, Barnes BM. Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach.Appl Opt2012;51: 6196–6206..
Kennedy J, Eberhart RC. A discrete binary version of the particle swarm algorithm In: 1997 IEEE International Conference on Systems, Man, and Cybernetics; 12–15 October 1997; Orlando, FL, USA. IEEE: Piscataway, NJ, USA, 1997. pp4104–4108.
Henn MA, Silver RM, Villarrubia JS, Zhang NF, Zhou Het al. Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression. In: Cain JP, Sanchez MI, editors.Metrology, Inspection, and Process Control for Microlithography XXIX; 22–26 February 2015; San Jose, CA, USA. SPIE: Bellingham, WA, USA, 2015. p94241J..
Endres J, Diener A, Wurm M, Bodermann B. Investigations of the influence of common approximations in scatterometry for dimensional nanometrology.Meas Sci Technol2014;25: 044004..
American National Standards Institute.US Guide to the Uncertainty of Measurement.Washington: ANSI; 1997.
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