Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process

Sina Malobabic; Marco Jupé; Detlev Ristau

doi:10.1038/lsa.2016.44

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Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process

Original Articles

- Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process
- Light: Science & Applications Vol. 5, Issue 2, (2016)
- Affiliations：
  
  1.Laser Zentrum Hannover e.V., Hollerithallee 8, D-30419 Hannover, Germany
  2.QUEST: Centre for Quantum Engineering and Space-Time Research, Leibniz Universität Hannover, Hannover, Germany
- Author bio：
  
  S Malobabic, Email: Sina.malobabic@web.de
- Funds：
- DOI：10.1038/lsa.2016.44
  CLC：
- Published：2016-06，
  
  Published Online：12 November 2015，
  
  Received：13 August 2015，
  
  Revised：03 November 2015，
  
  Accepted：10 November 2015
- Accepted：
Scan QR Code
Malobabic, S., Jupé, M. & Ristau, D. Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process. Light: Science & Applications, 5, e16044 (2016).
DOI：

Malobabic, S., Jupé, M. & Ristau, D. Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process. Light: Science & Applications, 5, e16044 (2016). DOI： 10.1038/lsa.2016.44.

摘要

Abstract

In the present state of the art

ion beam sputtering is used to produce low-loss dielectric optics. During the manufacturing of a dielectric layer stack

the deposition material must be changed

which requires rapid mechanical movement of vacuum components. These mechanical components can be regarded as a risk factor for contamination during the coating process

which limits the quality of high-end laser components. To minimize the particle contamination

we present a novel deposition concept that does not require movable components to change the coating material during the coating process. A magnetic field guiding technique has been developed

which enables the tuning of the refractive index in the layer structure by sputtering mixtures with varying compositions of two materials using a single-ion source. The versatility of this new concept is demonstrated for a high-reflection mirror.

关键词

Keywords

EM field separationion beam sputteringplasma guiding

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