X-ray focusing with efficient high-NA multilayer Laue lenses

Saša Bajt; Mauro Prasciolu; Holger Fleckenstein; Martin Domaracký; Henry N Chapman; Andrew J Morgan; Oleksandr Yefanov; Marc Messerschmidt; Yang Du; Kevin T Murray; Valerio Mariani; Manuela Kuhn; Steven Aplin; Kanupriya Pande; Pablo Villanueva-Perez; Karolina Stachnik; Joe PJ Chen; Andrzej Andrejczuk; Alke Meents; Anja Burkhardt; David Pennicard; Xiaojing Huang; Hanfei Yan; Evgeny Nazaretski; Yong S Chu; Christian E Hamm

doi:10.1038/lsa.2017.162

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X-ray focusing with efficient high-NA multilayer Laue lenses

Original Articles

- X-ray focusing with efficient high-NA multilayer Laue lenses
- Light: Science & Applications Vol. 7, Issue 2, (2018)
- Affiliations：
  
  1.Photon Science, DESY, Notkestrasse 85, Hamburg 22607, Germany
  2.Center for Free-Electron Laser Science, DESY, Notkestrasse 85, Hamburg 22607, Germany
  3.Department of Physics, University of Hamburg, Luruper Chaussee 149, Hamburg 22607, Germany
  4.Centre for Ultrafast Imaging, Luruper Chaussee 149, Hamburg 22607, Germany
  5.National Science Foundation BioXFEL Science and Technology Center, 700 Ellicott Street, Buffalo, NY 14203, USA
  6.Department of Physics, Arizona State University, Tempe, AZ 85287, USA
  7.Faculty of Physics, University of Bialystok, Ciolkowskiego 1L Str., Bialystok 15-245, Poland
  8.National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA
  9.Alfred-Wegener Institute, Helmholtz Center for Polar and Marine Research, Bussestr. 27, Bremerhaven 27570, Germany
- Author bio：
  
  S Bajt, Email: sasa.bajt@desy.de
- Funds：
- DOI：10.1038/lsa.2017.162
  CLC：
- Published：2018，
  
  Published Online：23 March 2018，
  
  Received：02 July 2017，
  
  Revised：19 November 2017，
  
  Accepted：20 November 2017
- Accepted：
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Bajt, S. et al. X-ray focusing with efficient high-NA multilayer Laue lenses. Light: Science & Applications, 2, 17162 (2018).
DOI：

Bajt, S. et al. X-ray focusing with efficient high-NA multilayer Laue lenses. Light: Science & Applications, 2, 17162 (2018). DOI： 10.1038/lsa.2017.162.

摘要

Abstract

Multilayer Laue lenses are volume diffraction elements for the efficient focusing of X-rays. With a new manufacturing technique that we introduced

it is possible to fabricate lenses of sufficiently high numerical aperture (NA) to achieve focal spot sizes below 10 nm. The alternating layers of the materials that form the lens must span a broad range of thicknesses on the nanometer scale to achieve the necessary range of X-ray deflection angles required to achieve a high NA. This poses a challenge to both the accuracy of the deposition process and the control of the materials properties

which often vary with layer thickness. We introduced a new pair of materials—tungsten carbide and silicon carbide—to prepare layered structures with smooth and sharp interfaces and with no material phase transitions that hampered the manufacture of previous lenses. Using a pair of multilayer Laue lenses (MLLs) fabricated from this system

we achieved a two-dimensional focus of 8.4 × 6.8 nm

at a photon energy of 16.3 keV with high diffraction efficiency and demonstrated scanning-based imaging of samples with a resolution well below 10 nm. The high NA also allowed projection holographic imaging with strong phase contrast over a large range of magnifications. An error analysis indicates the possibility of achieving 1 nm focusing.

关键词

Keywords

multilayer Laue lensesmultilayersptychographyX-ray holographyX-ray optics

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