
1.Fujian Provincial Key Laboratory of Semiconductors and Applications, Collaborative Innovation Center for Optoelectronic Semiconductors and Efficient Devices, Department of Physics, Xiamen University, Xiamen 361005, China
2.Department of Physics, Xiamen University Malaysia, Sepang 43900, Malaysia
3.Department of New Energy Science and Engineering, Xiamen University Malaysia, Sepang 43900, Malaysia
4.College of Science, Henan University of Technology, Zhengzhou 450001, China
Hui-Qiong Wang (hqwang@xmu.edu.cn)
Jin-Cheng Zheng (jczheng@xmu.edu.cn)
Published:31 August 2021,
Published Online:27 July 2021,
Received:14 December 2020,
Revised:24 June 2021,
Accepted:06 July 2021
Scan QR Code
Wang, H. Q. et al. Determination of the embedded electronic states at nanoscale interface via surface-sensitive photoemission spectroscopy. Light: Science & Applications, 10, 1421-1431 (2021).
Wang, H. Q. et al. Determination of the embedded electronic states at nanoscale interface via surface-sensitive photoemission spectroscopy. Light: Science & Applications, 10, 1421-1431 (2021). DOI: 10.1038/s41377-021-00592-9.
The fabrication of small-scale electronics usually involves the integration of different functional materials. The electronic states at the nanoscale interface plays an important role in the device performance and the exotic interface physics. Photoemission spectroscopy is a powerful technique to probe electronic structures of valence band. However
this is a surface-sensitive technique that is usually considered not suitable for the probing of buried interface states
due to the limitation of electron-mean-free path. This article reviews several approaches that have been used to extend the surface-sensitive techniques to investigate the buried interface states
which include hard X-ray photoemission spectroscopy
resonant soft X-ray angle-resolved photoemission spectroscopy and thickness-dependent photoemission spectroscopy. Especially
a quantitative modeling method is introduced to extract the buried interface states based on the film thickness-dependent photoemission spectra obtained from an integrated experimental system equipped with in-situ growth and photoemission techniques. This quantitative modeling method shall be helpful to further understand the interfacial electronic states between functional materials and determine the interface layers.
Williams, C. T.&Beattie, D. A. Probing buried interfaces with non-linear optical spectroscopy.Surf. Sci.500, 545–576 (2002)..
Mannhart, J.&Schlom, D. G. Oxide interfaces—an opportunity for electronics.Science327, 1607–1611 (2010)..
Ngai, J. H., Walker, F. J.&Ahn, C. H. Correlated oxide physics and electronics.Annu. Rev. Mater. Res.44, 1–17 (2014)..
Ngai, J. H. et al. Electrically coupling complex oxides to semiconductors: a route to novel material functionalities.J. Mater. Res.32, 249–259 (2017)..
Mathews, S. et al. Ferroelectric field effect transistor based on epitaxial perovskite heterostructures.Science276, 238–240 (1997)..
Jackeli, G.&Khaliullin, G. Spin, orbital, and charge order at the interface between correlated oxides.Phys. Rev. Lett.101, 216804 (2008)..
Ohtomo, A. et al. Artificial charge-modulationin atomic-scale perovskite titanate superlattices.Nature419, 378–380 (2002)..
Ohtomo, A.&Hwang, H. Y. A high-mobility electron gas at the LaAlO3/SrTiO3heterointerface.Nature427, 423–426 (2004)..
Gozar, A. et al. High-temperature interface superconductivity between metallic and insulating copper oxides.Nature455, 782–785 (2008)..
Hwang, H. Y. et al. Emergent phenomena at oxide interfaces.Nat. Mater.11, 103–113 (2012)..
Reyren, N. et al. Superconducting interfaces between insulating oxides.Science317, 1196–1199 (2007)..
Reiner, J. W., Walker, F. J.&Ahn, C. H. Atomically engineered oxide interfaces.Science323, 1018–1019 (2009)..
Schlom, D. G.&Pfeiffer, L. N. Upward mobility rocks!Nat. Mater.9, 881–883 (2010)..
Siemons, W. et al. Origin of charge density at LaAlO3on SrTiO3heterointerfaces: possibility of intrinsic doping.Phys. Rev. Lett.98, 196802 (2007)..
Liu, Z. Q. et al. Origin of the two-dimensional electron gas at LaAlO3/SrTiO3interfaces: the role of oxygen vacancies and electronic reconstruction.Phys. Rev. X3, 021010 (2013)..
Kumari, P. et al. Nanoscale 2D semi-conductors–Impact of structural properties on light propagation depth and photocatalytic performance.Sep. Purif. Technol.258, 118011 (2021)..
Mayer, M. T. et al. Forming heterojunctions at the nanoscale for improved photoelectrochemical water splitting by semiconductor materials: case studies on hematite.Acc. Chem. Res.46, 1558–1566 (2013)..
Gholipour, M. R. et al. Nanocomposite heterojunctions as sunlight-driven photocatalysts for hydrogen production from water splitting.Nanoscale7, 8187–8208 (2015)..
Stoev, K.&Sakurai, K. Recent progresses in nanometer scale analysis of buried layers and interfaces in thin films by X-rays and Neutrons.Anal. Sci.36, 901–922 (2020)..
Friedbacher, G.&Bubert, H. Surface and Thin Film Analysis: A Compendium of Principles, Instrumentation, and Applications. 2nd edn. (Weinheim: Wiley-VCH, 2011).
Imae, T. Nanolayer Research: Methodology and Technology for Green Chemistry. (Amsterdam: Elsevier, 2017).
González-Cobos, J.&de Lucas-Consuegra, A. A review of surface analysis techniques for the investigation of the phenomenon of electrochemical promotion of catalysis with alkaline ionic conductors.Catalysts6, 15 (2016)..
Seah M., Chiffre L. Surface and Interface Characterization. In: Springer Handbook of Materials Measurement Methods. (eds Czichos H., Saito T., Smith L.) (Berlin: Springer 2006).
Zachman, M. J. et al. Emerging electron microscopy techniques for probing functional interfaces in energy materials.Angew. Chem. Int. Ed.59, 1384–1396 (2020)..
Zhou, H. et al. Interfaces between hexagonal and cubic oxides and their structure alternatives.Nat. Commun.8, 1474 (2017)..
Nakagawa, N., Hwang, H. Y.&Muller, D. A. Why some interfaces cannot be sharp.Nat. Mater.5, 204–209 (2006)..
Muller, D. A. et al. Atomic-scale chemical imaging of composition and bonding by aberration-corrected microscopy.Science319, 1073–1076 (2008)..
Brillson, L. J. Applications of depth-resolved cathodoluminescence spectroscopy.J. Phys. D: Appl. Phys.45, 183001 (2012)..
Chen, L. et al. Reversing abnormal hole localization in high-Al-content AlGaN quantum well to enhance deep ultraviolet emission by regulating the orbital state coupling.Light. : Sci. Appl.9, 104 (2020)..
Balerna, A.&Mobilio, S. Introduction to synchrotron radiation. In: Synchrotron Radiation (ed Mobilio, S., Boscherini, F.&Meneghini, C.) (Berlin: Springer, 2015).
Pryds, N.&Esposito, V. Metal Oxide-Based Thin Film Structures. (Amsterdam: Elsevier, 2018).
Seah, M. P.&Dench, W. A. Quantitative electron spectroscopy of surfaces: a standard database for electron inelastic mean free paths in solids.Surf. Interface Anal.1, 2–11 (1979)..
Cancellieri, C.&Strocov, V. N. Spectroscopy of Complex Oxide Interfaces: Photoemission and Related Spectroscopies. (Cham: Springer, 2018).
Krzywiecki, M., Sarfraz, A.&Erbe, A. Towards monomaterial p-n junctions: Single-step fabrication of tin oxide films and their non-destructive characterisation by angle-dependent X-ray photoelectron spectroscopy.Appl. Phys. Lett.107, 231601 (2015)..
Sing, M. et al. Profiling the interface electron gas of LaAlO3/SrTiO3heterostructures with hard x-ray photoelectron spectroscopy.Phys. Rev. Lett.102, 176805 (2009)..
Mizushima, H. et al. Impact of oxygen on band structure at the Ni/GaN interface revealed by hard X-ray photoelectron spectroscopy.Appl. Phys. Lett.118, 121603 (2021)..
Sushko, P. V.&Chambers, S. A. Extracting band edge profiles at semiconductor heterostructures from hard-x-ray core-level photoelectron spectra.Sci. Rep.10, 13028 (2020)..
Romanyuk, O. et al. Hard X-ray photoelectron spectroscopy study of core level shifts at buried GaP/Si(001) interfaces.Surf. Interface Anal.52, 933–938 (2020)..
Spencer, B. F. et al. Inelastic background modelling applied to hard X-ray photoelectron spectroscopy of deeply buried layers: a comparison of synchrotron and lab-based (9.25 keV) measurements.Appl. Surf. Sci.541, 148635 (2021)..
Kobayashi, M. et al. Digging up bulk band dispersion buried under a passivation layer.Appl. Phys. Lett.101, 242103 (2012)..
Drera, G. et al. Spectroscopic evidence of in-gap states at the SrTiO3/LaAlO3ultrathin interfaces.Appl. Phys. Lett.98, 052907 (2011)..
Koitzsch, A. et al. In-gap electronic structure of LaAlO3-SrTiO3heterointerfaces investigated by soft x-ray spectroscopy.Phys. Rev. B84, 245121 (2011)..
Cancellieri, C. et al. Interface Fermi states of LaAlO3/SrTiO3and related heterostructures.Phys. Rev. Lett.110, 137601 (2013)..
Berner, G. et al. Direct k-space mapping of the electronic structure in an oxide-oxide interface.Phys. Rev. Lett.110, 247601 (2013)..
Cancellieri, C. et al. Doping-dependent band structure of LaAlO3/SrTiO3interfaces by soft x-ray polarization-controlled resonant angle-resolved photoemission.Phys. Rev. B89, 121412 (2014)..
Crepaldi, A. et al. Interplay between electronic and structural properties in the Pb/Ag(1 0 0) interface.J. Phys. : Condens. Matter27, 455502 (2015)..
Nemšák, S. et al. Observation by resonant angle-resolved photoemission of a critical thickness for 2-dimensional electron gas formation in SrTiO3embedded in GdTiO3.Appl. Phys. Lett.107, 231602 (2015)..
Bouravleuv, A. D. et al. Electronic structure of (In, Mn)As quantum dots buried in GaAs investigated by soft-x-ray ARPES.Nanotechnology27, 425706 (2016)..
Lev, L. L. et al. Band structure of the EuO/Si interface: justification for silicon spintronics.J. Mater. Chem. C.5, 192–200 (2017)..
Bruno, F. Y. et al. Electronic structure of buried LaNiO3layers in (111)-oriented LaNiO3/LaMnO3superlattices probed by soft x-ray ARPES. APL.Materials5, 016101 (2017)..
Woerle, J. et al. Electronic band structure of the buried SiO2/SiC interface investigated by soft x-ray ARPES.Appl. Phys. Lett.110, 132101 (2017)..
Strocov, V. N. et al. Electronic phase separation at LaAlO3/SrTiO3interfaces tunable by oxygen deficiency. Physical Review.Materials3, 106001 (2019)..
Gray, A. X. et al. Momentum-resolved electronic structure at a buried interface from soft X-ray standing-wave angle-resolved photoemission.EPL104, 17004 (2013)..
Plumb, N. C.&Radovic, M. Angle-resolved photoemission spectroscopy studies of metallic surface and interface states of oxide insulators.J. Phys. : Condens. Matter29, 433005 (2017)..
Diebold, U.&Shinn, N. D. Adsorption and thermal stability of Mn on TiO2(110): 2p X-ray absorption spectroscopy and soft X-ray photoemission.Surf. Sci.343, 53–60 (1995)..
Gao, X. Y. et al. Thickness dependence of X-ray absorption and photoemission in Fe thin films on Si (0 0 1).J. Electron Spectrosc. Relat. Phenom.151, 199–203 (2006)..
Sánchez-Agudo, M. et al. Electronic interaction at the TiO2–Al2O3interface as observed by X-ray absorption spectroscopy.Surf. Sci.482-485, 470–475 (2001)..
Holmström, E. et al. Sample preserving deep interface characterization technique.Phys. Rev. Lett.97, 266106 (2006)..
Nalwa, H. S. Handbook of Surfaces and Interfaces of Materials (San Diego: Academic Press, 2001).
Henrich, V. E.&Cox, P. A. The Surface Science of Metal Oxides. (Cambridge: Cambridge University Press, 1994).
Chambers, S. A. Epitaxial growth and properties of thin film oxides.Surf. Sci. Rep.39, 105–180 (2000)..
Schlom, D. G. et al. A thin film approach to engineering functionality into oxides.J. Am. Ceram. Soc.91, 2429–2454 (2008)..
Franchi, S. Molecular beam epitaxy: fundamentals, historical background and future prospects. In: Molecular Beam Epitaxy: From Research to Mass Production (ed Henini, M.) (Amsterdam: Elsevier, 2013).
Schlom, D. G.&Harris, J. S. Jr. MBE Growth Of High Tc superconductors. in Molecular Beam Epitaxy: Applications to Key Materials (ed Farrow, R. F. C.) (Park Ridge: Noyes, 1995), 505-622.
Bozovic, I.&Schlom, D. G. Superconducting thin films: materials, preparation, and properties. In: Encyclopedia of Materials: Science and Technology (eds Buschow, K. H. J. et al.) (Amsterdam: Elsevier, 2001), 8955-8964.
Henini M. Molecular Beam Epitaxy: From Research to Mass Production (Amsterdam: Elsevier 2018)
Chrisey, D. B.&Hubler, G. K. Pulsed Laser Deposition of Thin Films. (New York: Wiley, 1994).
Frey, T. et al. Effect of atomic oxygen on the initial growth mode in thin epitaxial cuprate films.Phys. Rev. B49, 3483–3491 (1994)..
Koster, G. et al. Imposed layer-by-layer growth by pulsed laser interval deposition.Appl. Phys. Lett.74, 3729–3731 (1999)..
Brock, J. D. et al. Nucleation, coarsening, and coalescence during layer-by-layer growth of complex oxides via pulsed laser deposition: time-resolved, diffuse X-ray scattering studies.Mater. Sci. Eng. : A528, 72–76 (2010)..
de Keijser, M.&Dormans, G. J. M. Chemical vapor deposition of electroceramic thin films.MRS Bull.21, 37–43 (1996)..
Roeder, J. F. et al. Liquid-delivery MOCVD: chemical and process perspectives on ferro-electric thin film growth.Adv. Mater. Opt. Electron.10, 145–154 (2000)..
Holloway, P. H.&McGuire, G. E. Handbook of Compound Semiconductors: Growth, Processing, Characterization, and Devices. (Noyes, New Jersey1995).
Jaggernauth, A., Mendes, J. C.&Silva, R. F. Atomic layer deposition of high-κ layers on polycrystalline diamond for MOS devices: a review.J. Mater. Chem. C.8, 13127–13153 (2020)..
Maina, J. W. et al. Atomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications. Crit. Rev. Solid State Mater. Sci.https://doi.org/10.1080/10408436.2020.1819200https://doi.org/10.1080/10408436.2020.1819200(2020)
Schlom, D. G. Perspective: oxide molecular-beam epitaxy rocks.APL Mater.3, 062403 (2015)..
Ichimiya, A.&Cohen, P. I.Reflection High-Energy Electron Diffraction. (Cambridge University Press, Cambridge, 2004).
Fisher, P. et al. Stoichiometric, nonstoichiometric, and locally nonstoichiometric SrTiO3films grown by molecular beam epitaxy.J. Appl. Phys.103, 013519 (2008)..
Haeni, J. H., Theis, C. D.&Schlom, D. G. RHEED intensity oscillations for the stoichiometric growth of SrTiO3thin films by reactive molecular beam epitaxy.J. Electroceram.4, 385–391 (2000)..
Li, Y. P. et al. Interfacial electronic states of misfit heterostructure between hexagonal ZnO and cubic NiO.Phys. Rev. Mater.4, 124601 (2020)..
Oshima, M. et al. Combinatorial in situ Growth-and-analysis with synchrotron radiation of thin films for oxide electronics.AIP Conf. Proc.879, 1667–1670 (2007)..
Wang, H. Q., Altman, E. I.&Henrich, V. E. Interfacial properties between CoO (100) and Fe3O4(100).Phys. Rev. B77, 085313 (2008)..
Xu, H. C. et al. In situ engineering and characterization on the artificial heterostructures of correlated materials with integrated OMBE–ARPES.J. Electron Spectrosc. Relat. Phenom.200, 347–355 (2015)..
Chikamatsu, A. et al. Band structure and Fermi surface of La0.6Sr0.4MnO3thin films studied by in situ angle-resolved photoemission spectroscopy.Phys. Rev. B73, 195105 (2006)..
Wadati, H. et al. In situ photoemission study of Nd1−xSrxMnO3epitaxial thin films.Phys. Rev. B79, 153106 (2009)..
Tebano, A. et al. Preferential occupation of interface bands in La2/3Sr1/3MnO3films as seen via angle-resolved photoemission.Phys. Rev. B82, 214407 (2010)..
Wadati, H. et al. Strong localization of doped holes in La1−xSrxFeO3from angle resolved photoemission spectra.Phys. Rev. B74, 115114 (2006)..
Aizaki, S. et al. Self-energy on the low- to high-energy electronic structure of correlated metal SrVO3.Phys. Rev. Lett.109, 056401 (2012)..
Yoshimatsu, K. et al. Metallic quantum well states in artificial structures of strongly correlated oxide.Science333, 319–322 (2011)..
Chang, Y. J. et al. Layer-by-layer evolution of a two-dimensional electron gas near an oxide interface.Phys. Rev. Lett.111, 126401 (2013)..
Chang, C. C. General formalism for quantitative auger analysis.Surf. Sci.48, 9–21 (1975)..
Wang, H. Q. et al. Studies of the electronic structure at the Fe3O4– NiO interface.J. Vac. Sci. Technol. A22, 1675–1681 (2004)..
Wang, H. Q., Altman, E. I.&Henrich, V. E. Measurement of electronic structure at nanoscale solid-solid interfaces by surface-sensitive electron spectroscopy.Appl. Phys. Lett.92, 012118 (2008)..
Wang, H. Q. et al. Determination of electronic structure of oxide–oxide interfaces by photoemission spectroscopy.Adv. Mater.22, 2950–2956 (2010)..
Tanuma, S., Powell, C. J.&Penn, D. R. Calculations of electron inelastic mean free paths (IMFPS). Ⅳ. Evaluation of calculated IMFPs and of the predictive IMFP formula TPP-2 for electron energies between 50 and 2000 eV.Surf. Interface Anal.20, 77–89 (1993)..
Tanuma, S., Powell, C. J.&Penn, D. R. Calculations of Electron Inelastic Mean Free Paths (IMFPs) Ⅵ. AnalYsis Of The Gries Inelastic Scattering Model And Predictive IMFP equation.Surf. Interface Anal.25, 25–35 (1997)..
Shah, A. B. et al. Probing interfacial electronic structures in atomic layer LaMnO3and SrTiO3superlattices.Adv. Mater.22, 1156–1160 (2010)..
van der Zaag, P. J. et al. On the construction of an Fe3O4-based all-oxide spin valve.J. Magn. Magn. Mater.211, 301–308 (2000)..
van der Heijden, P. A. A. et al. Evidence for roughness driven 90° coupling in Fe3O4/NiO/Fe3O4trilayers.Phys. Rev. Lett.82, 1020–1023 (1999)..
Borchers, J. A. et al. Polarized neutron diffraction studies of exchange-coupled Fe3O4/NiO superlattices.J. Appl. Phys.85, 5883–5885 (1999)..
Borchers, J. A. et al. Detection of field-dependent antiferromagnetic domains in exchange-biased Fe3O4/NiO superlattices.Appl. Phys. Lett.77, 4187–4189 (2000)..
Terashima, T.&Bando, Y. Formation and magnetic properties of artificial superlattice of CoO-Fe3O4.Thin Solid Films152, 455–463 (1987)..
Fork, D. K., Philips, J. M., Ramesh, R., Wolf, R. M. Epitaxial oxide thin films and heterostructures. InMater. Res. Soc. Symp. Proc(ed. Pittsburgh, P. A.)341, 23–28 (1994)..
Fadley, C. S. et al. Photoelectron diffraction: new dimensions in space, time, and spin.J. Electron Spectrosc. Relat. Phenom.75, 273–297 (1995)..
Zheng, J. C. et al. Simulations of X-ray photoelectron diffraction experiment from theoretical calculations.Surf. Rev. Lett.8, 549–557 (2001)..
Zheng, J. C. et al. Atomic-scale structure of the fivefold surface of an AlPdMn quasicrystal: a quantitative x-ray photoelectron diffraction analysis.Phys. Rev. B69, 134107 (2004)..
Zheng, J. C. et al. On the sensitivity of electron and X-ray scattering factors to valence charge distribution.J. Appl. Crystallogr.38, 648–656 (2005)..
Zheng, J. C., Wu, L. J.&Zhu, Y. M. Aspherical electron scattering factors and their parameterizations for elements from H to Xe.J. Appl. Crystallogr.42, 1043–1053 (2009)..
Zheng, J. C. et al. Nanoscale disorder and local electronic properties of CaCu3Ti4O12: an integrated study of electron, neutron, and x-ray diffraction, x-ray absorption fine structure, and first-principles calculations.Phys. Rev. B81, 144203 (2010)..
Zheng, J. C.&Wang, H. Q. Principles and applications of a comprehensive characterization method combining synchrotron radiation technology, transmission electron microscopy, and density functional theory.Sci. Sin. : Phys., Mech. Astronom.51, 030007 (2021)..
0
Views
0
Downloads
0
CSCD
Publicity Resources
Related Articles
Related Author
Related Institution
京公网安备11010802024621