Tantalum pentoxide: a new material platform for high-performance dielectric metasurface optics in the ultraviolet and visible region

Cheng Zhang; Lu Chen; Zhelin Lin; Junyeob Song; Danyan Wang; Moxin Li; Okan Koksal; Zi Wang; Grisha Spektor; David Carlson; Henri J. Lezec; Wenqi Zhu; Scott Papp; Amit Agrawal

doi:10.1038/s41377-023-01330-z

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Tantalum pentoxide: a new material platform for high-performance dielectric metasurface optics in the ultraviolet and visible region

Article

- Tantalum pentoxide: a new material platform for high-performance dielectric metasurface optics in the ultraviolet and visible region
- Light: Science & Applications Vol. 13, Issue 1, Pages: 142-152(2024)
- Affiliations：
- Author bio：
  
  acheng.zhang@hust.edu.cn
  qamit.agrawal@nist.gov
- Funds：
- DOI：10.1038/s41377-023-01330-z
  CLC：
- Received：07 August 2023，
  
  Revised：22 October 2023，
  
  Accepted：2023-11-06，
  
  Published Online：22 January 2024，
  
  Published：2024-12
- Accepted：
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Cheng Zhang, Lu Chen, Zhelin Lin, et al. Tantalum pentoxide: a new material platform for high-performance dielectric metasurface optics in the ultraviolet and visible region[J]. Light: science & applications, 2024, 13(1): 142-152.
DOI：

Cheng Zhang, Lu Chen, Zhelin Lin, et al. Tantalum pentoxide: a new material platform for high-performance dielectric metasurface optics in the ultraviolet and visible region[J]. Light: science & applications, 2024, 13(1): 142-152. DOI： 10.1038/s41377-023-01330-z.

摘要

Abstract

Dielectric metasurfaces

mposed of planar arrays of subwavelength dielectric structures that collectively mimic the operation of conventional bulk optical elements

have revolutionized the field of optics by their potential in constructing high-efficiency and multi-functional optoelectronic systems on chip. The performance of a dielectric metasurface is largely determined by its constituent material

which is highly desired to have a high refractive index

low optical loss and wide bandgap

and at the same time

be fabrication friendly. Here

we present a new material platform based on tantalum pentoxide (Ta

) for implementing high-performance dielectric metasurface optics over the ultraviolet and visible spectral region. This wide-bandgap dielectric

exhibiting a high refractive index exceeding 2.1 and negligible extinction coefficient across a broad spectrum

can be easily deposited over large areas with good quality using straightforward physical vapor deposition

and patterned into high-aspect-ratio subwavelength nanostructures through commonly-available fluorine-gas-based reactive ion etching. We implement a series of high-efficiency ultraviolet and visible metasurfaces with representative light-field modulation functionalities including polarization-independent high-numerical-aperture lensing

spin-selective hologram projection

and vivid structural color generation

and the devices exhibit operational efficiencies up to 80%. Our work overcomes limitations faced by scalability of commonly-employed metasurface dielectrics and their operation into the visible and ultraviolet spectral range

and provides a novel route towards realization of high-performance

robust and foundry-manufacturable metasurface optics.

关键词

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references

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