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1.Department of Electrical and Computer Engineering, National University of Singapore, Singapore 119077, Singapore
2.Department of Microelectronic Engineering, Rochester Institute of Technology, Rochester, NY 14623, USA
3.School of Information Science and Engineering, Shandong University, Jinan 250100, China
Xiao Gong (elegong@nus.edu.sg)
Received:04 March 2024,
Revised:16 July 2024,
Accepted:2024-07-25,
Published Online:23 August 2024,
Published:31 October 2024
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Zhang, G. et al. Thin film ferroelectric photonic-electronic memory. Light: Science & Applications, 13, 2251-2262 (2024).
Zhang, G. et al. Thin film ferroelectric photonic-electronic memory. Light: Science & Applications, 13, 2251-2262 (2024). DOI: 10.1038/s41377-024-01555-6.
To reduce system complexity and bridge the interface between electronic and photonic circuits
there is a high demand for a non-volatile memory that can be accessed both electrically and optically. However
practical solutions are still lacking when considering the potential for large-scale complementary metal-oxide semiconductor compatible integration. Here
we present an experimental demonstration of a non-volatile photonic-electronic memory based on a 3-dimensional monolithic integrated ferroelectric-silicon ring resonator. We successfully demonstrate programming and erasing the memory using both electrical and optical methods
assisted by optical-to-electrical-to-optical conversion. The memory cell exhibits a high optical extinction ratio of 6.6 dB at a low working voltage of 5 V and an endurance of 4 × 10
4
cycles. Furthermore
the multi-level storage capability is analyzed in detail
revealing stable performance with a raw bit-error-rate smaller than 5.9 × 10
−2
. This ground-breaking work could be a key technology enabler for future hybrid electronic-photonic systems
targeting a wide range of applications such as photonic interconnect
high-speed data communication
and neuromorphic computing.
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