Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition

Chengzhao Luo; Yanhui Ding; Zhenwei Ren; Chenglong Wu; Yonghuan Huo; Xin Zhou; Zhiyong Zheng; Xinwen Wang; Yu Chen

doi:10.1038/s41377-024-01601-3

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Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition

Original Articles

- Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition
- Light: Science & Applications Vol. 13, Issue 11, Pages: 2745-2755(2024)
- Affiliations：
  
  1.School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, China
  2.National University of Singapore Suzhou Research Institute, Dushu Lake Science and Education Innovation District, Suzhou 215123, China
- Author bio：
  
  Zhenwei Ren (zhwren@suda.edu.cn)
  Yu Chen (chenyu_ny@suda.edu.cn)
- Funds：
- DOI：10.1038/s41377-024-01601-3
  CLC：
- Published：30 November 2024，
  
  Published Online：26 September 2024，
  
  Received：12 June 2024，
  
  Revised：27 July 2024，
  
  Accepted：22 August 2024
- Accepted：
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Luo, C. Z. et al. Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition. Light: Science & Applications, 13, 2745-2755 (2024).
DOI：

Luo, C. Z. et al. Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition. Light: Science & Applications, 13, 2745-2755 (2024). DOI： 10.1038/s41377-024-01601-3.

摘要

Abstract

The high pixel resolution is emerging as one of the key parameters for the next-generation displays. Despite the development of various quantum dot (QD) patterning techniques

achieving ultrahigh-resolution (

000 pixels per inch (PPI)) and high-fidelity QD patterns is still a tough challenge that needs to be addressed urgently. Here

we propose a novel and effective approach of orthogonal electric field-induced template-assisted dielectric electrophoretic deposition to successfully achieve one of the highest pixel resoluti

ons of 23090 (PPI) with a high fidelity of up to 99%. Meanwhile

the proposed strategy is compatible with the preparation of QD pixels based on perovskite CsPbBr

and conventional CdSe QDs

exhibiting a wide applicability for QD pixel fabrication. Notably

we further demonstrate the great value of our approach to achieve efficiently electroluminescent QD pixels with a peak external quantum efficiency of 16.5%. Consequently

this work provides a general approach for realizing ultrahigh-resolution and high-fidelity patterns based on various QDs and a novel method for fabricating QD-patterned devices with high performance.

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references

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