
1.Aalto University, Department of Electronics and Nanoengineering, Espoo, Finland
2.ElFys, Inc., Espoo, Finland
3.Physikalisch-Technische Bundesanstalt, Berlin, Germany
Hele Savin (hele.savin@aalto.fi)
Published:31 January 2025,
Published Online:01 January 2025,
Received:30 April 2024,
Revised:18 October 2024,
Accepted:2024-10-26
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Liu, H. C. et al. Near-infrared germanium PIN-photodiodes with > 1A/W responsivity. Light: Science & Applications, 14, 110-117 (2025).
Liu, H. C. et al. Near-infrared germanium PIN-photodiodes with > 1A/W responsivity. Light: Science & Applications, 14, 110-117 (2025). DOI: 10.1038/s41377-024-01670-4.
Even though efficient near-infrared (NIR) detection is critical for numerous applications
state-of-the-art NIR detectors either suffer from limited capability of detecting incoming photons
i.e.
have poor spectral responsivity
or are made of expensive group Ⅲ-Ⅴ non-CMOS compatible materials. Here we present a nanoengineered PIN-photodiode made of CMOS-compatible germanium (Ge) that achieves a verified external quantum efficiency (EQE) above 90% over a wide wavelength range (1.2–1.6 µm) at zero bias voltage at room temperature. For instance
at 1.55 µm
this corresponds to a responsivity of 1.15 A/W. In addition to the excellent spectral responsivity at NIR
the performance at visible and ultraviolet wavelengths remains high (EQE exceeds even 100% below 300 nm) resulting in an exceptionally wide spectral response range. The high performance is achieved by minimizing optical losses using surface nanostructures and electrical losses using both conformal atomic-layer-deposited aluminum oxide surface passivation and dielectric induced electric field -based carrier collection instead of conventional pn-junction. The dark current density of 76 µA/cm
2
measured at a reverse bias of 5 V is lower than previously reported for Ge photodiodes. The presented results should have an immediate impact on the design and manufacturing of Ge photodiodes and NIR detection in general.
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