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1.School of Physics, State Key Laboratory of Crystal Materials, Shandong University, Jinan, China
2.School of Chemistry and Chemical Engineering, Shandong University, Jinan, China
3.Department of Materials Science and Engineering, City University of Hong Kong, Hong Kong, China
4.Institute for Materials Chemistry and Engineering, Kyushu University, Fukuoka, Japan
5.State Key Laboratory of Terahertz and Millimeter Waves, City University of Hong Kong, Hong Kong, China
Weifeng Li (lwf@sdu.edu.cn)
Feng Chen (drfchen@sdu.edu.cn)
Johnny C. Ho (johnnyho@cityu.edu.hk)
Zai-xing Yang (zaixyang@sdu.edu.cn)
Received:19 May 2025,
Revised:2025-09-16,
Accepted:11 October 2025,
Online First:04 February 2026,
Published:30 April 2026
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Sa, Z. X. et al. Induced fit growth of Ga-based semiconductor thin films for brain-inspired electronics and optoelectronics. Light: Science & Applications, 15, 1182-1193 (2026).
Sa, Z. X. et al. Induced fit growth of Ga-based semiconductor thin films for brain-inspired electronics and optoelectronics. Light: Science & Applications, 15, 1182-1193 (2026). DOI: 10.1038/s41377-025-02096-2.
Current crystalline thin-film production techniques typically require specific growth substrates
posing significant challenges for their use in flexible electronics and integrated optoelectronics. In response to these challenges
we introduce a novel method called 'induced fit growth'
inspired by the induced fit theory in molecular biology. This method overcomes the limitations of current techniques by enabling the deposition of Ga-based semiconductor films
including GaSb
GaSe
GaAs
and GaAsSb
with controllable thickness and morphology on arbitrary substrates. Utilizing a low-cost
wafer-scale vapor deposition process compatible with standard semiconductor procedures
these Ga-based films can be patterned for various functional applications. For example
the patterned Ga-based thin films exhibit broad applicability in p-channel transistor arrays (with hole mobility of 0.25 cm
2
V⁻
1
s⁻
1
)
functional synaptic devices
and flexible omnidirectional imaging sensors (maintaining functionality at incident angles as low as 5°). Overall
the proposed induced fit growth method facilitates the growth of Ga-based semiconductor films with greater integration flexibility
enhancing their advanced functionality and broad applicability.
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