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1.State Key Laboratory of Integrated Optoelectronics, Key Laboratory of UV-Emitting Materials and Technology of Ministry of Education, Northeast Normal University, Changchun 130024, China
2.School of Science, Jilin University of Chemical Technology, Jilin 132022, China
3.GPL Photon Lab, State Key Laboratory of Luminescence Science and Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
4.Key Laboratory of Functional Materials Physics and Chemistry of Ministry of Education, Jilin Normal University, Changchun 130103, China
5.State Key Laboratory of Integrated Optoelectronics, JLU Region, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Wei Xin (xinwei@nenu.edu.cn)
Weizhen Liu (wzliu@nenu.edu.cn)
Haiyang Xu (hyxu@nenu.edu.cn)
Received:29 September 2025,
Revised:2025-12-18,
Accepted:28 December 2025,
Online First:21 January 2026,
Published:31 March 2026
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Zhang, Y. Y. et al. High-efficiency femtosecond laser fabrication of graphene-hybrid planar micro-supercapacitors with micro/nanostructured electrodes. Light: Science & Applications, 15, 835-847 (2026).
Zhang, Y. Y. et al. High-efficiency femtosecond laser fabrication of graphene-hybrid planar micro-supercapacitors with micro/nanostructured electrodes. Light: Science & Applications, 15, 835-847 (2026). DOI: 10.1038/s41377-025-02182-5.
The integration of surface-regular micro/nanostructured electrodes within a limited footprint area is promising to enhance the electrochemical performance of planar micro-supercapacitors (P-MSCs)
while developing simple yet efficient manufacturing methods for such electrodes remains a challenge. Here
we propose a universal strategy combining femtosecond laser plasma lithography with spatial light modulation (SLM-FPL)
fabricating well-ordered sub-wavelength micro/nanostructured electrodes of interdigital P-MSCs (SEP-MSCs) on graphene oxide (GO) films. Achieving 500/50 µm finger widths/spacings and 680 nm internal grating periods
this method enables device densities
>
25 units inch
−2
with processing efficiency orders of magnitude higher than conventional laser direct writing. Further performance optimizations via wettability modification
electric field engineering
and hybrid composites (GO-MXene/COF) yield outstanding specific capacitance (~41.4 F cm
−3
) and cycling stability (93% retention over 5000 cycles)
supporting applications in flexible sensors and compact power supplies. This SLM-FPL technology shows strong potential for high-performance
spatially efficient SEP-MSCs in next-generation integrated systems.
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