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1.State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, China
2.Centre for Atomaterials and Nanomanufacturing, School of Science, RMIT University, Melbourne 3000 VIC, Australia
3.State Key Laboratory for Manufacturing System Engineering and Shaanxi Key Laboratory of Photonics Technology for Information, School of Electronic Science and Engineering, Xi’an Jiaotong University, Xi’an 710049, China
Bo Zhang (zhangbobo@zju.edu.cn)
Jianrong Qiu (qjr@zju.edu.cn)
Received:20 August 2025,
Revised:2026-02-09,
Accepted:23 February 2026,
Online First:18 March 2026,
Published:30 June 2026
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Wang, Z. et al. Single-pulse lithography of amorphous photonic architectures inside all-inorganic dielectric crystals. Light: Science & Applications, 15, 1985-1995 (2026).
Wang, Z. et al. Single-pulse lithography of amorphous photonic architectures inside all-inorganic dielectric crystals. Light: Science & Applications, 15, 1985-1995 (2026). DOI: 10.1038/s41377-026-02253-1.
High-efficiency light modulation within transparent substrates is critically important for advancing in-chip integrated optical technologies. However
current micro/nanophotonic platforms primarily rely on 2D surface configurations
rendering them inadequate for 3D optical design in dielectric environments. Here
we introduce a precise phase-transition technique that enables the direct lithography of highly regular amorphous units in multiple transparent dielectric crystals (lithium niobates
quartz
yttrium vanadate
etc.). This unit can be rapidly written with a single ultrafast laser pulse
exhibiting a high-purity amorphization phase transition interior structure and a regular sheet-like anisotropic spatial morphology (aspect ratio reaching 190:1). We reveal that this amorphization stems from ultrafast laser-driven anisotropic thermal deposition
achieved through the synergy of the light-induced high-density free electrons and thermal effects. Such embedded units achieve more than an order of magnitude improvement in the efficiency of nonlinear beam shaping (~3% second harmonic and ~0.1% third harmonic) and offer multiple degrees of freedom for device design. This study establishes a versatile platform for on-demand production of all-dielectric micro/nanophotonic architectures in the free space of transparent dielectrics
unlocking new avenues for 3D integrated photonics.
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