Ultrahigh-<italic style="font-style: italic">Q</italic> integrated flame-hydrolysis-deposited germano-silicate resonators on silicon

Hao-Jing Chen; Kellan Colburn; Hanfei Hou; Hongrui Yan; Avani Ranka; Jin-Yu Liu; Lue Wu; Bruno Moog; Oleksandr Buchnev; Stefano Fornetti; Christopher Holmes; James Gates; Dirk Bouwmeester; Henry Blauvelt; Kerry Vahala

doi:10.1038/s41377-026-02353-y

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Ultrahigh-Q integrated flame-hydrolysis-deposited germano-silicate resonators on silicon

Original Articles

- Ultrahigh-Q integrated flame-hydrolysis-deposited germano-silicate resonators on silicon
- Light: Science & Applications Vol. 15, Issue 8, Pages: 2884-2891(2026)
- Affiliations：
  
  1.T. J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA, USA
  2.Optoelectronics Research Centre, University of Southampton, Southampton, UK
  3.School of Engineering, University of Southampton, Southampton, UK
  4.Department of Physics, University of California Santa Barbara, Santa Barbara, CA, USA
  5.Huygens-Kamerlingh Onnes Laboratory, Leiden University, Leiden, The Netherlands
- Author bio：
  
  Hao-Jing Chen (haojing@caltech.edu)
  Kellan Colburn (kcolburn@caltech.edu)
  Kerry Vahala (vahala@caltech.edu)
- Funds：
- DOI：10.1038/s41377-026-02353-y
  CLC：
- Received：01 December 2025，
  
  Revised：2026-05-16，
  
  Accepted：16 May 2026，
  
  Online First：04 June 2026，
  
  Published：31 August 2026
- Accepted：
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Chen, H. J. et al. Ultrahigh-Q integrated flame-hydrolysis-deposited germano-silicate resonators on silicon. Light: Science & Applications, 15, 2884-2891 (2026).
DOI：

Chen, H. J. et al. Ultrahigh-Q integrated flame-hydrolysis-deposited germano-silicate resonators on silicon. Light: Science & Applications, 15, 2884-2891 (2026). DOI： 10.1038/s41377-026-02353-y.

摘要

Abstract

Optical fibres

owing to their ultra-low transmission loss

underpin global telecommunications. However

this remarkable low-loss performan

ce has not been extended to integrated photonic devices

which are increasingly critical for data-intensive communications in the era of artificial intelligence (AI). Here

we translate the widely adopted mass-production process for fibre manufacturing—flame hydrolysis—to wafer-scale integrated photonics

and demonstrate ultrahigh-

integrated microresonators. By leveraging high GeO

doping

the deposited germano-silicate (Ge:silica) films achieve full densification at moderate thermal budgets

while also allowing for a post-processing furnace-reflow technique that has the capability to both repair any etch-induced defects and enhance optical

leading to a high degree of process tolerance. When combined with deep-UV lithography

these films form microresonators exhibiting ultrahigh

factors of up to 566 million at 1064 nm

corresponding to a waveguide propagation loss as low as 0.07 dB m

−1

. Like their fibre counterparts

these devices exhibit a broad transmission window with

factors surpassing 100 million demonstrated from the telecommunications band to the violet spectrum. Moreover

the width dependence of

factor and a two-order-of-magnitude

recovery enabled by the furnace reflow process are also demonstrated. This work extends high-quality

high-rate flame hydrolysis deposition (FHD) from optical fibre manufacturing to integrated photonics

establishing a scalable route towards fibre-level loss in photonic integrated circuits.

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references

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Ultrahigh-Q integrated flame-hydrolysis-deposited germano-silicate resonators on silicon

DOI：10.1038/s41377-026-02353-y

摘要

Abstract

关键词

Keywords

references