Liquid deposition photolithography for submicrometer resolution three-dimensional index structuring with large throughput

Adam C Urness; Eric D Moore; Keith K Kamysiak; Michael C Cole; Robert R McLeod

doi:10.1038/lsa.2013.12

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Liquid deposition photolithography for submicrometer resolution three-dimensional index structuring with large throughput

Original Articles

- Liquid deposition photolithography for submicrometer resolution three-dimensional index structuring with large throughput
- Liquid deposition photolithography for submicrometer resolution three-dimensional index structuring with large throughput
- LSA 2013年2卷第1-2期
- Affiliations：
  
  Department of Electrical Engineering, University of Colorado at Boulder, Boulder, CO 80309, USA
- Author bio：
  
  Professor RR McLeod, Department of Electrical Engineering, University of Colorado at Boulder, Boulder, CO 80309, USA. E-mail: Robert.Mcleod@colorado.edu
- Funds：
- DOI：10.1038/lsa.2013.12
  中图分类号：
- 纸质出版日期：2013-06，
  
  网络出版日期：2013-03-01，
  
  收稿日期：2012-07-16，
  
  修回日期：2012-11-13，
  
  录用日期：2012-11-14
- Accepted：
Scan QR Code
Liquid deposition photolithography for submicrometer resolution three-dimensional index structuring with large throughput[J]. LSA, 2013,2(1-2).

Urness, A. C. et al. Liquid deposition photolithography for submicrometer resolution three-dimensional index structuring with large throughput. Light: Science & Applications, 2, e56 (2013).
Liquid deposition photolithography for submicrometer resolution three-dimensional index structuring with large throughput[J]. LSA, 2013,2(1-2). DOI： 10.1038/lsa.2013.12.

Urness, A. C. et al. Liquid deposition photolithography for submicrometer resolution three-dimensional index structuring with large throughput. Light: Science & Applications, 2, e56 (2013). DOI： 10.1038/lsa.2013.12.

摘要

Abstract

Photonic devices increasingly require three-dimensional co

ntrol of refractive index

but existing fabrication methods such as femtosecond micromachining

multilayer lithography and bulk diffusion can only address a select scale range

are often limited in complexity or thickness and have low throughput. We introduce a new fabrication method and polymeric material that can efficiently create mm

optical devices with programmable

gradient index of refraction with arbitrary feature size. Index contrast of 0.1 is demonstrated

which is 100 times larger than femtosecond micromachining

and 20 times larger than commercial holographic photopolymers. This is achieved by repetitive microfluidic layering of a self-developing photopolymer structured by projection lithography. The process has the unusual property that total fabrication time for a fixed thickness decreases with the number of layers

enabling fabrication 10

faster than femtosecond micromachining. We demonstrate the process by sequentially writing 100 layers to fabricate a mm thick waveguide array.

关键词

Keywords

holographic photopolymerslithographyphotonic device fabricationsingle photon polymerizationthree-dimensional structuring

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