1.School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, China
2.National University of Singapore Suzhou Research Institute, Dushu Lake Science and Education Innovation District, Suzhou 215123, China
Zhenwei Ren (zhwren@suda.edu.cn)
Yu Chen (chenyu_ny@suda.edu.cn)
收稿日期:2024-06-12,
修回日期:2024-07-27,
录用日期:2024-08-22,
网络出版日期:2024-09-26,
纸质出版日期:2024-11-30
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Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition[J]. LSA, 2024,13(11):2745-2755.
Luo, C. Z. et al. Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition. Light: Science & Applications, 13, 2745-2755 (2024).
Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition[J]. LSA, 2024,13(11):2745-2755. DOI: 10.1038/s41377-024-01601-3.
Luo, C. Z. et al. Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition. Light: Science & Applications, 13, 2745-2755 (2024). DOI: 10.1038/s41377-024-01601-3.
The high pixel resolution is emerging as one of the key parameters for the next-generation displays. Despite the development of various quantum dot (QD) patterning techniques
achieving ultrahigh-resolution (
>
10
000 pixels per inch (PPI)) and high-fidelity QD patterns is still a tough challenge that needs to be addressed urgently. Here
we propose a novel and effective approach of orthogonal electric field-induced template-assisted dielectric electrophoretic deposition to successfully achieve one of the highest pixel resoluti
ons of 23090 (PPI) with a high fidelity of up to 99%. Meanwhile
the proposed strategy is compatible with the preparation of QD pixels based on perovskite CsPbBr
3
and conventional CdSe QDs
exhibiting a wide applicability for QD pixel fabrication. Notably
we further demonstrate the great value of our approach to achieve efficiently electroluminescent QD pixels with a peak external quantum efficiency of 16.5%. Consequently
this work provides a general approach for realizing ultrahigh-resolution and high-fidelity patterns based on various QDs and a novel method for fabricating QD-patterned devices with high performance.
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