Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating

Wenhao Li; Xinyu Wang; Bayanheshig; Zhaowu Liu; Wei Wang; Shan Jiang; Yubo Li; Shuo Li; Wei Zhang; Yanxiu Jiang; Zheng Wu; Wenyuan Zhou

doi:10.1038/s41377-025-01785-2

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Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating

Original Articles

- Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating
- Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating
- LSA 2025年14卷第4期页码：1081-1093
- Affiliations：
  
  1.Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 130033 Changchun, Jilin, China
  2.University of Chinese Academy of Sciences, 100049 Beijing, China
- Author bio：
  
  Wenhao Li (liwh@ciomp.ac.cn)
  null null (bayin888@sina.com)
- Funds：
- DOI：10.1038/s41377-025-01785-2
  中图分类号：
- 收稿日期：2024-11-17，
  
  修回日期：2025-02-10，
  
  录用日期：2025-02-11，
  
  网络出版日期：2025-03-05，
  
  纸质出版日期：2025-04-30
- Accepted：
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Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating[J]. LSA, 2025,14(4):1081-1093.

Li, W. H. et al. Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating. Light: Science & Applications, 14, 1081-1093 (2025).
Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating[J]. LSA, 2025,14(4):1081-1093. DOI： 10.1038/s41377-025-01785-2.

Li, W. H. et al. Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating. Light: Science & Applications, 14, 1081-1093 (2025). DOI： 10.1038/s41377-025-01785-2.

摘要

Abstract

The scanning interference field exposure technique is an effective method to fabricate holographic diffraction grating with meter-level size and nano-level precision. The main problems of fabricating large-aperture and high-precision grating by this technique are the high-precision displacement measurement of the stage

the high-precision control of the interference fringe and the real time compensation of

the grating phase error. In this paper

the influence of grating groove error on the wavefront aberration is analyzed. In order to improve the precision of the stage with displacement range more than one meter

an integrated displacement measurement combining grating sensing and laser interferometry is proposed

which suppresses the influence of environment on measurement precision under long displacement range. An interference fringe measurement method is proposed

which combines the diffraction characteristics of the measuring grating with the phase-shifting algorithm. By controlling the direction

period and phase nonlinear errors of the interference fringe

high quality interference fringe can be obtained. Further

a dynamic phase-locking model is established by using heterodyne interferometry to compensate grating phase error caused by stage motion error in real time. A grating with the aperture of 1500 mm × 420 mm is fabricated. The wavefront aberration reaches 0.327

@ 632.8 nm and the wavefront gradient reaches 16.444 nm/cm. This research presents a novel technique for the fabrication of meter-level size and nano-level precision holographic grating

which would further promote the development of chirped pulse amplification systems

high-energy laser and ultra-high precision displacement measurement.

关键词

Keywords

references

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