Subnanometer localization accuracy in widefield optical microscopy

Craig R. Copeland; Jon Geist; Craig D. McGray; Vladimir A. Aksyuk; J. Alexander Liddle; B. Robert Ilic; Samuel M. Stavis

doi:10.1038/s41377-018-0031-z

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Subnanometer localization accuracy in widefield optical microscopy

Original Articles

- Subnanometer localization accuracy in widefield optical microscopy
- Light: Science & Applications Vol. 7, Issue 4, Pages: 281-295(2018)
- Affiliations：
  
  1.Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
  2.Maryland NanoCenter, University of Maryland, College Park, MD 20742, USA
  3.Engineering Physics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
- Author bio：
  
  Samuel M. Stavis (samuel.stavis@nist.gov)
- Funds：
- DOI：10.1038/s41377-018-0031-z
  CLC：
- Published：2018，
  
  Published Online：11 July 2018，
  
  Received：01 December 2017，
  
  Revised：24 April 2018，
  
  Accepted：01 May 2018
- Accepted：
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Copeland, C. R. et al. Subnanometer localization accuracy in widefield optical microscopy. Light: Science & Applications, 7, 281-295 (2018).
DOI：

Copeland, C. R. et al. Subnanometer localization accuracy in widefield optical microscopy. Light: Science & Applications, 7, 281-295 (2018). DOI： 10.1038/s41377-018-0031-z.

摘要

Abstract

The common assumption that precision is the limit of accuracy in localization microscopy and the typical absence of comprehensive calibration of optical microscopes lead to a widespread issue—overconfidence in measurement results with nanoscale statistical uncertainties that can be invalid due to microscale systematic errors. In this article

we report a comprehensive solution to this underappreciated problem. We develop arrays of subresolution apertures into the first reference materials that enable localization errors approaching the atomic scale across a submillimeter field. We present novel methods for calibrating our microscope system using aperture arrays and develop aberration corrections that reach the precision limit of our reference materials. We correct and register localization data from multiple colors and test different sources of light emission with equal accuracy

indicating the general applicability of our reference materials and calibration methods. In a first application of our new measurement capability

we introduce the concept of critical-dimension localization microscopy

facilitating tests of nanofabrication processes and quality control of aperture arrays. In a second application

we apply these stable reference materials to answer open questions about the apparent instability of fluorescent nanoparticles that commonly serve as fiducial markers. Our study establishes a foundation for subnanometer localization accuracy in widefield optical microscopy.

关键词

Keywords

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