
Department of Electrical and Computer Engineering, University of California, San Diego, 9500 Gilman Dr., La Jolla, CA 92023, USA
Shimon Rubin (rubin.shim@gmail.com)
Brandon Hong (bjhong@eng.ucsd.edu)
Yeshaiahu Fainman (fainman@eng.ucsd.edu)
Published:2019,
Published Online:28 August 2019,
Received:18 May 2019,
Revised:01 August 2019,
Accepted:05 August 2019
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Rubin, S., Hong, B. & Fainman, Y. Subnanometer imaging and controlled dynamical patterning of thermocapillary driven deformation of thin liquid films. Light: Science & Applications, 8, 776-786 (2019).
Rubin, S., Hong, B. & Fainman, Y. Subnanometer imaging and controlled dynamical patterning of thermocapillary driven deformation of thin liquid films. Light: Science & Applications, 8, 776-786 (2019). DOI: 10.1038/s41377-019-0190-6.
Exploring and controlling the physical factors that determine the topography of thin liquid dielectric films are of interest in manifold fields of research in physics
applied mathematics
and engineering and have been a key aspect of many technological advancements. Visualization of thin liquid dielectric film topography and local thickness measurements are essential tools for characterizing and interpreting the underlying processes. However
achieving high sensitivity with respect to subnanometric changes in thickness via standard optical methods is challenging. We propose a combined imaging and optical patterning projection platform that is capable of optically inducing dynamical flows in thin liquid dielectric films and plasmonically resolving the resulting changes in topography and thickness. In particular
we employ the thermocapillary effect in fluids as a novel heat-based method to tune plasmonic resonances and visualize dynamical processes in thin liquid dielectric films. The presented results indicate that light-induced thermocapillary flows can form and translate droplets and create indentation patterns on demand in thin liquid dielectric films of subwavelength thickness and that plasmonic microscopy can image these fluid dynamical processes with a subnanometer sensitivity along the vertical direction.
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