O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment

Zhen-Ze Li; Lei Wang; Hua Fan; Yan-Hao Yu; Qi-Dai Chen; Saulius Juodkazis; Hong-Bo Sun

doi:10.1038/s41377-020-0275-2

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O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment

Article

- O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment
- Light: Science & Applications Vol. 9, Issue 2, Pages: 377-383(2020)
- Affiliations：
  
  1.State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
  2.Nanotechnology Facility, Swinburne University of Technology, John St., Hawthorn 3122 Vic, Australia
  3.State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing 100084, China
- Author bio：
  
  Qi-Dai Chen (chenqd@jlu.edu.cn)
  Saulius Juodkazis (sjuodkazis@swin.edu.au)
  Hong-Bo Sun (hbsun@tsinghua.edu.cn)
- Funds：
- DOI：10.1038/s41377-020-0275-2
  CLC：
- Published：2020，
  
  Published Online：16 March 2020，
  
  Received：02 February 2020，
  
  Revised：23 February 2020，
  
  Accepted：26 February 2020
- Accepted：
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Li, Z. Z. et al. O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment. Light: Science & Applications, 9, 377-383 (2020).
DOI：

Li, Z. Z. et al. O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment. Light: Science & Applications, 9, 377-383 (2020). DOI： 10.1038/s41377-020-0275-2.

摘要

Abstract

Nanoscale surface texturing

drilling

cutting

and spatial sculptu

ring

which are essential for applications

including thin-film solar cells

photonic chips

antireflection

wettability

and friction drag reduction

require not only high accuracy in material processing

but also the capability of manufacturing in an atmospheric environment. Widely used focused ion beam (FIB) technology offers nanoscale precision

but is limited by the vacuum-working conditions; therefore

it is not applicable to industrial-scale samples such as ship hulls or biomaterials

e.g.

cells and tissues. Here

we report an optical far-field-induced near-field breakdown (O-FIB) approach as an optical version of the conventional FIB technique

which allows direct nanowriting in air. The writing is initiated from nanoholes created by femtosecond-laser-induced multiphoton absorption

and its cutting pknife edgeq is sharpened by the far-field-regulated enhancement of the optical near field. A spatial resolution of less than 20 nm (

/40

with

being the light wavelength) is readily achieved. O-FIB is empowered by the utilization of simple polarization control of the incident light to steer the nanogroove writing along the designed pattern. The universality of near-field enhancement and localization makes O-FIB applicable to various materials

and enables a large-area printing mode that is superior to conventional FIB processing.

关键词

Keywords

references

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