
1.School of Optical and Electronic Information & Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, 430074 Wuhan, China
2.Physical Measurement Laboratory, National Institute of Standards and Technology, 20899 Gaithersburg, MD, USA
3.Maryland Nanocenter, University of Maryland, College Park, MD 20742, USA
4.National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, 210093 Nanjing, China
Cheng Zhang (cheng.zhang@hust.edu.cn)
Ting Xu (xuting@nju.edu.cn)
Henri J. Lezec (henri.lezec@nist.gov)
Published:2020,
Published Online:09 April 2020,
Received:01 December 2019,
Revised:25 February 2020,
Accepted:11 March 2020
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Zhang, C. et al. Low-loss metasurface optics down to the deep ultraviolet region. Light: Science & Applications, 9, 574-583 (2020).
Zhang, C. et al. Low-loss metasurface optics down to the deep ultraviolet region. Light: Science & Applications, 9, 574-583 (2020). DOI: 10.1038/s41377-020-0287-y.
Shrinking conventional optical systems to chip-scale dimensions will benefit custom applications in imaging
displaying
sensing
spectroscopy
and metrology. Towards this goal
metasurfaces—planar arrays of subwavelength electromagnetic structures that collectively mimic the functionality of thicker conventional optical elements—have been exploited at frequencies ranging from the microwave range up to the visible range. Here
we demonstrate high-performance metasurface optical components that operate at ultraviolet wavelengths
including wavelengths down to the record-short deep ultraviolet range
and perform representative wavefront shaping functions
namely
high-numerical-aperture lensing
accelerating beam generation
and hologram projection. The constituent nanostructured elements of the metasurfaces are formed of hafnium oxide—a loss-less
high-refractive-index dielectric material deposited using low-temperature atomic layer deposition and patterned using high-aspect-ratio Damascene lithography. This study opens the way towards low-form factor
multifunctional ultraviolet nanophotonic platforms based on flat optical components
enabling diverse applications including lithography
imaging
spectroscopy
and quantum information processing.
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