High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse

Tingting Zou; Bo Zhao; Wei Xin; Ye Wang; Bin Wang; Xin Zheng; Hongbo Xie; Zhiyu Zhang; Jianjun Yang; Chunlei Guo

doi:10.1038/s41377-020-0311-2

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High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse

Original Articles

- High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse
- Light: Science & Applications Vol. 9, Issue 3, Pages: 697-707(2020)
- Affiliations：
  
  1.State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 130033 Changchun, China
  2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, 100049 Beijing, China
  3.Department of Electronic Information and Physics, Changzhi University, 046011 Changzhi, China
  4.Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics (CIOMP), Chinese Academy of Sciences (CAS), 130033 Changchun, China
  5.The Institute of Optics, University of Rochester, Rochester, NY 14627, USA
- Author bio：
  
  Wei Xin (weixin@ciomp.ac.cn)
  Jianjun Yang(jjyang@ciomp.ac.cn)
  Chunlei Guo (chunlei.guo@rochester.edu)
- Funds：
- DOI：10.1038/s41377-020-0311-2
  CLC：
- Published：2020，
  
  Published Online：26 April 2020，
  
  Received：16 December 2019，
  
  Revised：01 April 2020，
  
  Accepted：07 April 2020
- Accepted：
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Zou, T. T. et al. High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse. Light: Science & Applications, 9, 697-707 (2020).
DOI：

Zou, T. T. et al. High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse. Light: Science & Applications, 9, 697-707 (2020). DOI： 10.1038/s41377-020-0311-2.

摘要

Abstract

Micro/nanoprocessing of graphene surfaces has attracted significant interest for both science and applications due to its effective modulation of material properties

which

however

is usually restricted by the disadvantages of the current fabrication methods. Here

by exploiting cylindrical focusing of a femtosecond laser on graphene oxide (GO) films

we successfully produce uniform subwavelength grating structures at high speed along with a simultaneous in situ photoreduction process. Strikingly

the well-defined structures feature orientations parallel to the laser polarization and significant robustness against distinct perturbations. The proposed model and simulations reveal that the structure formation is based on the transverse electric (TE) surface plasmons triggered by the gradient reduction of the GO film from its surface to the interior

which eventually results in interference intensity fringes and spatially periodic interactions. Further experiments prove that such a regular structured surface can cause enhanced optical absorption (> 20%) and an anisotropic photoresponse (~0.46 ratio) for the reduced GO film. Our work not only provides new insights into understanding the laser-GO interaction but also lays a solid foundation for practical usage of femtosecond laser plasmonic lithography

with the prospect of expansion to other two-dimensional materials for novel device applications.

关键词

Keywords

references

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