Self-organized phase-transition lithography for all-inorganic photonic textures

Bo Zhang; Dezhi Tan; Zhuo Wang; Xiaofeng Liu; Beibei Xu; Min Gu; Limin Tong; Jianrong Qiu

doi:10.1038/s41377-021-00534-5

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Self-organized phase-transition lithography for all-inorganic photonic textures

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- Self-organized phase-transition lithography for all-inorganic photonic textures
- Self-organized phase-transition lithography for all-inorganic photonic textures
- LSA 2021年10卷第6期页码：1020-1028
- Affiliations：
  
  1.State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027 Hangzhou, China
  2.School of Materials Science and Engineering, Zhejiang University, 310027 Hangzhou, China
  3.Centre for Artificial-Intelligence Nanophotonics, School of Optical Science and Engineering, Shanghai University of Science and Technology, 200093 Shanghai, China
  4.CAS Center for Excellence in Ultraintense Laser Science, Chinese Academy of Sciences, 201800 Shanghai, China
- Author bio：
  
  Dezhi Tan (wctdz@zju.edu.cn)
  Jianrong Qiu (qjr@zju.edu.cn)
- Funds：
- DOI：10.1038/s41377-021-00534-5
  中图分类号：
- 纸质出版日期：2021-06-30，
  
  网络出版日期：2021-04-29，
  
  收稿日期：2020-11-09，
  
  修回日期：2021-03-27，
  
  录用日期：2021-04-12
- Accepted：
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Self-organized phase-transition lithography for all-inorganic photonic textures[J]. LSA, 2021,10(6):1020-1028.

Zhang, B. et al. Self-organized phase-transition lithography for all-inorganic photonic textures. Light: Science & Applications, 10, 1020-1028 (2021).
Self-organized phase-transition lithography for all-inorganic photonic textures[J]. LSA, 2021,10(6):1020-1028. DOI： 10.1038/s41377-021-00534-5.

Zhang, B. et al. Self-organized phase-transition lithography for all-inorganic photonic textures. Light: Science & Applications, 10, 1020-1028 (2021). DOI： 10.1038/s41377-021-00534-5.

摘要

Abstract

Realizing general processing applicable to various materials by one basic tool has long been considered a distant dream. Fortunately

ultrafast laser–matter interaction has emerged as a highly universal platform with unprecedented optical phenomena and provided implementation paths for advanced manufacturing with novel functionalities. Here

we report the establishment of a three-dimensional (3D) focal-area interference field actively induced by a single ultrafast laser in transparent dielectrics. Relying on this

we demonstrate a radically new approach of self-organized phase-transition lithography (SOPTL) to achieve super-resolution construction of embedded all-inorganic photonic textures with extremely high efficiency. The generated textures exhibit a tunable photonic bandgap (PBG) in a wide range from ~1.3 to ~2?μm. More complicated interlaced textures with adjustable structural features can be fabricated within a few seconds

which is not attainable with any other conventional techniques. Evidence suggests that the SOPTL is extendable to more than one material system. This study augments light–matter interaction physics

offers a promising approach for constructing robust photonic devices

and opens up a new research direction in advanced lithography.

关键词

Keywords

references

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