1.State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, 100871, Beijing, China
2.Nano-optoelectronics Frontier Center of Ministry of Education, Peking University, 100871, Beijing, China
3.Collaborative Innovation Center of Quantum Matter, 100871, Beijing, China
Fujun Xu (fjxu@pku.edu.cn)
Bo Shen (bshen@pku.edu.cn)
纸质出版日期:2022-04-30,
网络出版日期:2022-03-24,
收稿日期:2021-09-02,
修回日期:2022-01-28,
录用日期:2022-02-25
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Sub-nanometer ultrathin epitaxy of AlGaN and its application in efficient doping[J]. LSA, 2022,11(4):654-661.
Wang, J. M. Sub-nanometer ultrathin epitaxy of AlGaN and its application in efficient doping. Light: Science & Applications, 11, 654-661 (2022).
Sub-nanometer ultrathin epitaxy of AlGaN and its application in efficient doping[J]. LSA, 2022,11(4):654-661. DOI: 10.1038/s41377-022-00753-4.
Wang, J. M. Sub-nanometer ultrathin epitaxy of AlGaN and its application in efficient doping. Light: Science & Applications, 11, 654-661 (2022). DOI: 10.1038/s41377-022-00753-4.
Solving the doping asymmetry issue in wide-gap semiconductors is a key difficulty and long-standing challenge for device applications. Here
a desorption-tailoring strategy is proposed to juggle the carrier concentration and transport. Specific to the p-doping issue in Al-rich AlGaN
self-assembled p-AlGaN superlattices with an average Al composition of over 50% are prepared by adopting this approach. The hole concentration as high as 8.1 × 10
18
cm
−3
is thus realized at room temperature
which is attributed to the significant reduction of effective Mg activation energy to 17.5 meV through modulating the activating path
as well as the highlighted Mg surface-incorporation by an intentional interruption for desorption. More importantly
benefiting from the constant ultrathin barrier thickness of only three monolayers via this approach
vertical miniband transport of holes is verified in the p-AlGaN superlattices
greatly satisfying the demand of hole injection in device application. 280 nm deep-ultraviolet light-emitting diodes are then fabricated as a demo with the desorption-tailored Al-rich p-AlGaN superlattices
which exhibit a great improvement of the carrier injection efficiency and light extract
ion efficiency
thus leading to a 55.7% increase of the light output power. This study provides a solution for p-type doping of Al-rich AlGaN
and also sheds light on solving the doping asymmetry issue in general for wide-gap semiconductors.
Chang, L. L., Esaki, L.&Tsu, R. Resonant tunneling in semiconductor double barriers.Appl. Phys. Lett.24, 593–595 (1974)..
Khan, M. A., Bhattarai, A., Kuznia, J. N.&Olson, D. T. High electron mobility transistor based on a GaN-AlxGa1−xN heterojunction.Appl. Phys. Lett.63, 1214–1215 (1993)..
Cui, Y., Wei, Q., Park, H.&Lieber, C. M. Nanowire nanosensors for highly sensitive and selective detection of biological and chemical species.Science293, 1289–1292 (2001)..
Taniyasu, Y., Kasu, M.&Makimoto, T. An aluminium nitride light-emitting diode with a wavelength of 210 nanometres.Nature441, 325–328 (2006)..
Michel, J., Liu, J.&Kimerling, L. C. High-performance Ge-on-Si photodetectors.Nat. Photon4, 527–534 (2010)..
Baliga, B. J., Adler, M. S., Love, R. P., Gray, P. V.&Zommer, N. D. The insulated gate transistor: a new three-terminal MOS-controlled bipolar power device.IEEE Trans. Electron Devices31, 821–828 (1984)..
Zhang, S. B., Wei, S. -H.&Zunger, A. Overcoming doping bottlenecks in semiconductors and wide-gap materials.Phys. B273-274, 976–980 (1999)..
Tsukazaki, A. et al. Repeated temperature modulation epitaxy for p-type doping and light-emitting diode based on ZnO.Nat. Mater.4, 42–46 (2005)..
Simon, J., Protasenko, V., Lian, C., Xing, H.&Jena, D. Polarization-induced hole doping in wide–band-gap uniaxial semiconductor heterostructures.Science327, 60–64 (2010)..
Koizumi, S., Watanabe, K., Hasegawa, M.&Kanda, H. Ultraviolet emission from a diamond pn junction.Science292, 1899–1901 (2001)..
Kneissl, M., Seong, T. -Y., Han, J.&Amano, H. The emergence and prospects of deep-ultraviolet light-emitting diode technologies.Nat. Photon13, 233–244 (2019)..
Nam, K. B., Nakarmi, M. L., Li, J., Lin, J. Y.&Jiang, H. X. Mg acceptor level in AlN probed by deep ultraviolet photoluminescence.Appl. Phys. Lett.83, 878–880 (2003)..
Zheng, T. et al. High Mg effective incorporation in Al-rich AlxGa1−xN by periodic repetition of ultimate Ⅴ/Ⅲ ratio conditions.Nanoscale Res. Lett.9, 40 (2014)..
Ebata, K., Nishinaka, J., Taniyasu, Y.&Kumakura, K. High hole concentration in Mg-doped AlN/AlGaN superlattices with high Al content.Jpn. J. Appl. Phys.57, 04FH09 (2018)..
Jiang, K. et al. Quantum engineering of non-equilibrium efficient p-doping in ultra-wide band-gap nitrides.Light. Sci. Appl.10, 69 (2021)..
Li, S. et al. Polarization induced hole doping in graded AlxGa1-xN (x=0.7~1) layer grown by molecular beam epitaxy.Appl. Phys. Lett.102, 062108 (2013)..
Chen, Y. et al. High hole concentration in p-type AlGaN by indium-surfactant-assisted Mg-delta doping.Appl. Phys. Lett.106, 162102 (2015)..
Susilo, N. et al. AlGaN-based deep UV LEDs grown on sputtered and high temperature annealed AlN/sapphire.Appl. Phys. Lett.112, 041110 (2018)..
Omori, T. et al. Internal loss of AlGaN-based ultraviolet-B band laser diodes with p-type AlGaN cladding layer using polarization doping.Appl. Phys. Express13, 071008 (2020)..
Tanaka, S. et al. AlGaN-based UV-B laser diode with a high optical confinement factor.Appl. Phys. Lett.118, 163504 (2021)..
Ambacher, O. et al. Thermal stability and desorption of Group Ⅲ nitrides prepared by metal organic chemical vapor deposition.J. Vac. Sci. Technol. B14, 3532–3542 (1996)..
Xing, H. et al. Memory effect and redistribution of Mg into sequentially regrown GaN layer by metalorganic chemical vapor deposition.Jpn. J. Appl. Phys.42, 50–53 (2003)..
Aoyagi, Y., Takeuchi, M., Iwai, S.&Hirayama, H. High hole carrier concentration realized by alternative co-doping technique in metal organic chemical vapor deposition.Appl. Phys. Lett.99, 112110 (2011)..
Qiu, X. et al. High doping efficiency in p-type Al-rich AlGaN by modifying the Mg doping planes.Mater. Adv.1, 77–85 (2020)..
Zheng, T. C. et al. Improved p-type conductivity in Al-rich AlGaN using multidimensional Mg-doped superlattices.Sci. Rep.6, 21897 (2016)..
Barnes, P. A.&Paoli, T. L. Derivative measurements of current-voltage characteristics of double-heterostructure injection lasers.IEEE J. Quantum Elect.12, 633–639 (1976)..
Tsu, R.&Esaki, L. Tunneling in a finite superlattice.Appl. Phys. Lett.22, 562–564 (1973)..
Sibille, A. inSemiconductor Superlattices, Growth and Electronic Properties(ed. Grahn, H. T. ) Ch. 2 (World Scientific, 1995).
Wang, D. et al. Controlling phase-coherent electron transport in Ⅲ-nitrides: toward room temperature negative differential resistance in AlGaN/GaN double barrier structures.Adv. Funct. Mater.31, 2007216 (2021)..
Zhang, N. et al. Improved light extraction efficiency of AlGaN deep-ultraviolet light emitting diodes combining Ag-nanodots/Al reflective electrode with highly transparent p-type layer.Opt. Express29, 2394–2401 (2021)..
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